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Integrated cleanroom process for the vapor-phase deposition of large-area zeolitic imidazolate framework thin films
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Integrated cleanroom process for the vapor-phase deposition of large-area zeolitic imidazolate framework thin films
| dc.contributor.author | Cruz, Alexander John | |
| dc.contributor.author | Stassen, Ivo | |
| dc.contributor.author | Krishtab, Mikhail | |
| dc.contributor.author | Marcoen, Kristof | |
| dc.contributor.author | Stassin, Timothée | |
| dc.contributor.author | Rodríguez-Hermida, Sabina | |
| dc.contributor.author | Teyssandier, Joan | |
| dc.contributor.author | Pletincx, Sven | |
| dc.contributor.author | Verbeke, Rhea | |
| dc.contributor.author | Rubio-Giménez, Víctor | |
| dc.contributor.author | Tatay Aguilar, Sergio | |
| dc.contributor.author | Martí Gastaldo, Carlos | |
| dc.contributor.author | Meersschaut, Johan | |
| dc.contributor.author | Vereecken, Philippe M. | |
| dc.contributor.author | De Feyter, Steven | |
| dc.contributor.author | Hauffman, Tom | |
| dc.contributor.author | Ameloot, Rob | |
| dc.date.accessioned | 2020-05-04T10:36:52Z | |
| dc.date.available | 2020-05-04T10:36:52Z | |
| dc.date.issued | 2019 | |
| dc.identifier.uri | https://hdl.handle.net/10550/74201 | |
| dc.description.abstract | Robust and scalable thin-film deposition methods are key to realize the potential of metal-organic frameworks (MOFs) in electronic devices. Here, we report the first integration of the chemical vapor deposition (CVD) of MOF coatings in a custom reactor within a cleanroom setting. As a test case, the MOF-CVD conditions for the zeolitic imidazolate framework-8 are optimized to enable smooth, pinhole-free, and uniform thin films on full 200 mm wafers under mild conditions. The single-chamber MOF-CVD process and the impact of the deposition parameters are elucidated via a combination of in situ monitoring and ex situ characterization. The resulting process guidelines will pave the way for new MOF-CVD formulations and a plethora of MOF-based devices. | |
| dc.language.iso | eng | |
| dc.relation.ispartof | Chemistry of Materials, 2019, vol. 31, num. 22, p. 9462-9471 | |
| dc.rights.uri | info:eu-repo/semantics/openAccess | |
| dc.source | Cruz, Alexander John Stassen, Ivo Krishtab, Mikhail Marcoen, Kristof Stassin, Timothée Rodríguez-Hermida, Sabina Teyssandier, Joan Pletincx, Sven Verbeke, Rhea Rubio-Giménez, Víctor Tatay Aguilar, Sergio Martí Gastaldo, Carlos Meersschaut, Johan Vereecken, Philippe M. De Feyter, Steven Hauffman, Tom Ameloot, Rob 2019 Integrated cleanroom process for the vapor-phase deposition of large-area zeolitic imidazolate framework thin films Chemistry of Materials 31 22 9462 9471 | |
| dc.subject | Química organometàl·lica | |
| dc.subject | Ciència dels materials | |
| dc.subject | Òxids | |
| dc.title | Integrated cleanroom process for the vapor-phase deposition of large-area zeolitic imidazolate framework thin films | |
| dc.type | info:eu-repo/semantics/article | |
| dc.date.updated | 2020-05-04T10:36:52Z | |
| dc.identifier.doi | https://doi.org/10.1021/acs.chemmater.9b03435 | |
| dc.identifier.idgrec | 136198 |
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