Integrated cleanroom process for the vapor-phase deposition of large-area zeolitic imidazolate framework thin films
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Integrated cleanroom process for the vapor-phase deposition of large-area zeolitic imidazolate framework thin films

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Integrated cleanroom process for the vapor-phase deposition of large-area zeolitic imidazolate framework thin films

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dc.contributor.author Cruz, Alexander John
dc.contributor.author Stassen, Ivo
dc.contributor.author Krishtab, Mikhail
dc.contributor.author Marcoen, Kristof
dc.contributor.author Stassin, Timothée
dc.contributor.author Rodríguez-Hermida, Sabina
dc.contributor.author Teyssandier, Joan
dc.contributor.author Pletincx, Sven
dc.contributor.author Verbeke, Rhea
dc.contributor.author Rubio-Giménez, Víctor
dc.contributor.author Tatay Aguilar, Sergio
dc.contributor.author Martí Gastaldo, Carlos
dc.contributor.author Meersschaut, Johan
dc.contributor.author Vereecken, Philippe M.
dc.contributor.author De Feyter, Steven
dc.contributor.author Hauffman, Tom
dc.contributor.author Ameloot, Rob
dc.date.accessioned 2020-05-04T10:36:52Z
dc.date.available 2020-05-04T10:36:52Z
dc.date.issued 2019
dc.identifier.uri https://hdl.handle.net/10550/74201
dc.description.abstract Robust and scalable thin-film deposition methods are key to realize the potential of metal-organic frameworks (MOFs) in electronic devices. Here, we report the first integration of the chemical vapor deposition (CVD) of MOF coatings in a custom reactor within a cleanroom setting. As a test case, the MOF-CVD conditions for the zeolitic imidazolate framework-8 are optimized to enable smooth, pinhole-free, and uniform thin films on full 200 mm wafers under mild conditions. The single-chamber MOF-CVD process and the impact of the deposition parameters are elucidated via a combination of in situ monitoring and ex situ characterization. The resulting process guidelines will pave the way for new MOF-CVD formulations and a plethora of MOF-based devices.
dc.language.iso eng
dc.relation.ispartof Chemistry of Materials, 2019, vol. 31, num. 22, p. 9462-9471
dc.rights.uri info:eu-repo/semantics/openAccess
dc.source Cruz, Alexander John Stassen, Ivo Krishtab, Mikhail Marcoen, Kristof Stassin, Timothée Rodríguez-Hermida, Sabina Teyssandier, Joan Pletincx, Sven Verbeke, Rhea Rubio-Giménez, Víctor Tatay Aguilar, Sergio Martí Gastaldo, Carlos Meersschaut, Johan Vereecken, Philippe M. De Feyter, Steven Hauffman, Tom Ameloot, Rob 2019 Integrated cleanroom process for the vapor-phase deposition of large-area zeolitic imidazolate framework thin films Chemistry of Materials 31 22 9462 9471
dc.subject Química organometàl·lica
dc.subject Ciència dels materials
dc.subject Òxids
dc.title Integrated cleanroom process for the vapor-phase deposition of large-area zeolitic imidazolate framework thin films
dc.type info:eu-repo/semantics/article
dc.date.updated 2020-05-04T10:36:52Z
dc.identifier.doi https://doi.org/10.1021/acs.chemmater.9b03435
dc.identifier.idgrec 136198

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