dc.contributor.author |
Cruz, Alexander John |
|
dc.contributor.author |
Stassen, Ivo |
|
dc.contributor.author |
Krishtab, Mikhail |
|
dc.contributor.author |
Marcoen, Kristof |
|
dc.contributor.author |
Stassin, Timothée |
|
dc.contributor.author |
Rodríguez-Hermida, Sabina |
|
dc.contributor.author |
Teyssandier, Joan |
|
dc.contributor.author |
Pletincx, Sven |
|
dc.contributor.author |
Verbeke, Rhea |
|
dc.contributor.author |
Rubio-Giménez, Víctor |
|
dc.contributor.author |
Tatay Aguilar, Sergio |
|
dc.contributor.author |
Martí Gastaldo, Carlos |
|
dc.contributor.author |
Meersschaut, Johan |
|
dc.contributor.author |
Vereecken, Philippe M. |
|
dc.contributor.author |
De Feyter, Steven |
|
dc.contributor.author |
Hauffman, Tom |
|
dc.contributor.author |
Ameloot, Rob |
|
dc.date.accessioned |
2020-05-04T10:36:52Z |
|
dc.date.available |
2020-05-04T10:36:52Z |
|
dc.date.issued |
2019 |
|
dc.identifier.uri |
https://hdl.handle.net/10550/74201 |
|
dc.description.abstract |
Robust and scalable thin-film deposition methods are key to realize the potential of metal-organic frameworks (MOFs) in electronic devices. Here, we report the first integration of the chemical vapor deposition (CVD) of MOF coatings in a custom reactor within a cleanroom setting. As a test case, the MOF-CVD conditions for the zeolitic imidazolate framework-8 are optimized to enable smooth, pinhole-free, and uniform thin films on full 200 mm wafers under mild conditions. The single-chamber MOF-CVD process and the impact of the deposition parameters are elucidated via a combination of in situ monitoring and ex situ characterization. The resulting process guidelines will pave the way for new MOF-CVD formulations and a plethora of MOF-based devices. |
|
dc.language.iso |
eng |
|
dc.relation.ispartof |
Chemistry of Materials, 2019, vol. 31, num. 22, p. 9462-9471 |
|
dc.rights.uri |
info:eu-repo/semantics/openAccess |
|
dc.source |
Cruz, Alexander John Stassen, Ivo Krishtab, Mikhail Marcoen, Kristof Stassin, Timothée Rodríguez-Hermida, Sabina Teyssandier, Joan Pletincx, Sven Verbeke, Rhea Rubio-Giménez, Víctor Tatay Aguilar, Sergio Martí Gastaldo, Carlos Meersschaut, Johan Vereecken, Philippe M. De Feyter, Steven Hauffman, Tom Ameloot, Rob 2019 Integrated cleanroom process for the vapor-phase deposition of large-area zeolitic imidazolate framework thin films Chemistry of Materials 31 22 9462 9471 |
|
dc.subject |
Química organometàl·lica |
|
dc.subject |
Ciència dels materials |
|
dc.subject |
Òxids |
|
dc.title |
Integrated cleanroom process for the vapor-phase deposition of large-area zeolitic imidazolate framework thin films |
|
dc.type |
info:eu-repo/semantics/article |
|
dc.date.updated |
2020-05-04T10:36:52Z |
|
dc.identifier.doi |
https://doi.org/10.1021/acs.chemmater.9b03435 |
|
dc.identifier.idgrec |
136198 |
|