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Integrated cleanroom process for the vapor-phase deposition of large-area zeolitic imidazolate framework thin films
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Cruz, Alexander John; Stassen, Ivo; Krishtab, Mikhail; Marcoen, Kristof; Stassin, Timothée; Rodríguez-Hermida, Sabina; Teyssandier, Joan; Pletincx, Sven; Verbeke, Rhea; Rubio-Giménez, Víctor; Tatay Aguilar, Sergio; Martí Gastaldo, Carlos; Meersschaut, Johan; Vereecken, Philippe M.; De Feyter, Steven; Hauffman, Tom; Ameloot, Rob
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This document is a artículoDate2019
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Robust and scalable thin-film deposition methods are key to realize the potential of metal-organic frameworks (MOFs) in electronic devices. Here, we report the first integration of the chemical vapor deposition (CVD) of MOF coatings in a custom reactor within a cleanroom setting. As a test case, the MOF-CVD conditions for the zeolitic imidazolate framework-8 are optimized to enable smooth, pinhole-free, and uniform thin films on full 200 mm wafers under mild conditions. The single-chamber MOF-CVD process and the impact of the deposition parameters are elucidated via a combination of in situ monitoring and ex situ characterization. The resulting process guidelines will pave the way for new MOF-CVD formulations and a plethora of MOF-based devices. |
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